A device for erasing magnetic data from personal computers, disks, etc. Data stored in recording media (2.5/3.5 inch HDD, CMT, LTO, DAT, DLT, VHS, etc.) can be erased instantly. We also offer a ren...
A device for erasing magnetic data from personal computers, disks, etc. Data stored in recording media (2.5/3.5 inch HDD, CMT, LTO, DAT, DLT, VHS, etc.) can be erased instantly. We also offer a re...
A device for erasing magnetic data from personal computers, disks, etc. Data stored in recording media (2.5/3.5 inch HDD, CMT, LTO, DAT, DLT, VHS, etc.) can be erased instantly. We also offer a re...
A washing machine (equipment) that removes dirt with dry ice. A method in which crushed dry ice pellets collide with an object (base material). Effective for removal of deposits (attachments) of pa...
A washing machine (equipment) that removes dirt with dry ice. A method in which crushed dry ice pellets collide with an object (base material). Effective for removal of deposits (attachments) of p...
Desktop type nano-pattern exposure (photolithography) equipment. Using the Talbot effect, it is possible to perform batch exposure with a half-pitch of 150 nm for periodic structures. Ideal for de...
Handy type UV illuminance meter (power meter) with touch screen and built-in USB. The successor model of the old model 358 manufactured by OAI. Calibration service is also available. We also sell d...
UV light source (Light source). Collimated light source for photolithography/exposure/photolithography applications. Made by OAI. For semiconductors, MEMS, research and development (R&D), low ...
UV LED light source (Light source). Collimated light source for photolithography/exposure/photolithography applications. Made by OAI. For semiconductors, MEMS, research and development (R&D), ...
Single-sided mask aligner (adhesion/proximity/contact exposure) system. optical. Fully automatic/fully automatic. For liquid crystal/FPD/LCD/flat panel displays and medium mass production. Large s...
Single-sided mask aligner (adhesion/proximity/contact exposure) equipment. Optical back exposure type. Fully automatic/fully automatic. For semiconductors, MEMS, research and development (R&D)....
Double-sided mask aligner (adhesion/proximity/contact exposure) system. optical. Alignment of top or bottom surface is possible. Semi-automatic/semi-automatic. For research and development (R&...
Single-sided mask aligner (adhesion/proximity/contact exposure) system. Benchtop type, compact and easy to install. Manual type. For research and development (R&D). reasonable. For medium-sized...
Single-sided mask aligner (adhesion/proximity/contact exposure) equipment. It is compact and easy to install because it is a desk/tabletop type. Manual type. For research and development (R&D)...
Nanoimprint equipment for UV exposure (lithography). This equipment is suitable for pattern transfer to substrates with unevenness and undulations such as resin and film. Semi-automatic (semi-autom...
Nanoimprint equipment for UV exposure (lithography). This equipment is suitable for pattern transfer to substrates with unevenness and undulations such as resin and film. Manual type. A method in ...
