Vacuum pump for multi-purpose/multi-spin processors (spin coaters/spinners/spinners) Polos. Spin150i, Spin200i, Spin300i.
*Photo shows VP-230V
For more information is here
A system that integrates a Polos spin coater and a high-precision chemical supply system to enable multiple processes to be set in one program. A safety-oriented model that incorporates chemical l...
Multi-purpose/multi-spin processor (spin coater/spinner/spinner) Centering tool (jig) for Polos Spin150i/200i/300. For 150i, φ2 to φ6 inch, up to 4 inch square board, for 200i, up to φ2 to φ8 inch...
Wafer/wafer/wafer (substrate) holder for chemical etching, electrolytic etching, and electrolytic plating (plating). A clamp type structure that prevents etchant/electrolyte from entering the back ...
Wafer/wafer/wafer (substrate) holder for chemical etching, electrolytic etching, and electrolytic plating (plating). A clamp type structure that prevents etchant/electrolyte from entering the back...
Wafer/wafer/wafer (substrate) holder for chemical etching, electrolytic etching, and electrolytic plating (plating). A clamp type structure that prevents etchant/electrolyte from entering the back...
Wafer/wafer/wafer (substrate) holder for chemical etching, electrolytic etching, and electrolytic plating (plating). A clamp type structure that prevents etchant/electrolyte from entering the back...
Wafer/wafer/wafer (substrate) holder for chemical etching, electrolytic etching, and electrolytic plating. A clamp type structure that prevents etchant/electrolyte from entering the back of the su...
Wafer/wafer/wafer (substrate) holder for chemical etching, electrolytic etching, and electrolytic plating (plating). A clamp type structure that prevents etchant/electrolyte from entering the back ...
Wafer/wafer/wafer (substrate) holder for chemical etching, electrolytic etching, and electrolytic plating (plating). A clamp type structure that prevents etchant/electrolyte from entering the back...
Nanoimprint equipment for UV exposure (lithography). This equipment is suitable for pattern transfer to substrates with unevenness and undulations such as resin and film. Manual type. A method in ...
Nanoimprint equipment for UV exposure (lithography). This equipment is suitable for pattern transfer to substrates with unevenness and undulations such as resin and film. Semi-automatic (semi-autom...
UV light source (Light source). Collimated light source for photolithography/exposure/photolithography applications. Made by OAI. For semiconductors, MEMS, research and development (R&D), low ...
Electrolyte tank with cover. Optional parts (parts) for desktop type plating (plating) systems (equipment). It is characterized by being able to form a film without going around to the backside of...
Desktop-type plating (plating) system (equipment). It is characterized by being able to form a film without going around to the backside of the substrate. Good in-plane distribution and reproducib...
A desktop device that produces nanoparticles. It is possible to create high-purity inorganic fine particles of 20 nm or less while controlling the size, purity, and particle components. dry type. ...
A printer option to add to the VSP-G1 desktop device that produces nanoparticles. Nanoparticles can be printed on the substrate by using together with G1. It is possible to create high-purity inor...
Desktop-sized hot plate suitable for pre-baking and post-baking. Customization is possible according to the application. Precision temperature control with alert sound function. For research and d...
A washing machine (equipment) that removes dirt with dry ice. A method in which crushed dry ice pellets collide with an object (base material). Effective for removal of deposits (attachments) of p...
A washing machine (equipment) that removes dirt with dry ice. A method in which crushed dry ice pellets collide with an object (base material). Effective for removal of deposits (attachments) of pa...
A washing machine (equipment) that removes dirt with dry ice. A method in which crushed dry ice pellets collide with an object (base material). Effective for removing oil stains and paint stripping...
Desktop type nano-pattern exposure (photolithography) equipment. Using the Talbot effect, it is possible to perform batch exposure with a half-pitch of 150 nm for periodic structures. Ideal for de...
Power supply (power supply). Optional parts (parts) for desktop type plating (plating) systems (equipment). It is characterized by being able to form a film without going around to the backside of...
