UV LED light source (Light source). Collimated light source for photolithography/exposure/photolithography applications. Made by OAI. For semiconductors, MEMS, research and development (R&D), ...
Single-sided mask aligner (adhesion/proximity/contact exposure) system. optical. Fully automatic/fully automatic. For liquid crystal/FPD/LCD/flat panel displays and medium mass production. Large s...
Single-sided mask aligner (adhesion/proximity/contact exposure) equipment. Optical back exposure type. Fully automatic/fully automatic. For semiconductors, MEMS, research and development (R&D)....
Double-sided mask aligner (adhesion/proximity/contact exposure) system. optical. Alignment of top or bottom surface is possible. Semi-automatic/semi-automatic. For research and development (R&...
Single-sided mask aligner (adhesion/proximity/contact exposure) system. Benchtop type, compact and easy to install. Manual type. For research and development (R&D). reasonable. For medium-sized...
Single-sided mask aligner (adhesion/proximity/contact exposure) equipment. It is compact and easy to install because it is a desk/tabletop type. Manual type. For research and development (R&D)...
Nanoimprint equipment for UV exposure (lithography). This equipment is suitable for pattern transfer to substrates with unevenness and undulations such as resin and film. Semi-automatic (semi-autom...
Nanoimprint equipment for UV exposure (lithography). This equipment is suitable for pattern transfer to substrates with unevenness and undulations such as resin and film. Manual type. A method in ...
