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UV Nanoimprint system TEX-01

Name: UV Nanoimprint system TEX-01
Brand: 協同インターナショナル
Price: 6000000.0 JPY
Availability: OutOfStock

協同インターナショナル

¥6,000,000

Sale Sold out

Nanoimprint equipment for UV exposure (lithography). This equipment is suitable for pattern transfer to substrates with unevenness and undulations such as resin and film. Manual type. A method in which a substrate coated with resin (polymer) and a soft mold are brought into close contact.

Simple configuration that does not require vacuum or pressurization
Resolution: Fine structure pattern fabrication at 100nm level
High productivity (1-2 minutes throughput)
Higher residual film controllability (15 nm or less) than conventional nanoimprint equipment
Achieves high in-plane uniformity due to excellent conformability to the substrate

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