POLOS µWriter POLOS µWriter

POLOS microwriter that enables optical exposure (photolithography). With confocal microscope. Equipped with microlaser control software. Mainly for 405nm laser. For research and development (R&D).

405nm laser, optical system including 3 lenses, confocal microscope with yellow illumination for focusing and basic aligning and inspection. 120mm/s writing speed. Maximum writing area 100x92mm^2. Substrate tilt levelling and full bed curvature calibration.
Including computer with pattern processing and microlaser control software.It can combine multiple patterns and make basic editing operations such as pattern inversion, rotations, framing and offset adjustments.Supported formats GDSII and PNG.