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High-purity silicon nitride target (Si3N4 sputtering target) thin film material for thin film formation with high vacuum sputtering deposition equipment.
Product name Description: Si3N4 2Nup φ101.6×t5
■ Specifications Specifications:・Material: Si3N4・Purity: 99% up・Size: φ101.6xt5・Other: Does not include bonding
Delivery: about 2 months (negotiable)
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