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Ceramic sintered high-purity alumina target (Al2O3 sputtering target) thin film material for thin film formation with high vacuum sputtering film deposition equipment.
Product name Description: Al2O3 4N φ101.6xt5
■ Specifications Specifications:・Material: Al2O3・Purity: 99.99%・Size Size: φ101.6xt5・Other: Does not include bonding
Delivery: about 2 months (negotiable)
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