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Alumina target Al2O3 Tatget φ101.6xt5

Vendor 高純度化学研究所
Regular price ¥109,000
Sale price ¥109,000 Regular price ¥55,000
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Ceramic sintered high-purity alumina target (Al2O3 sputtering target) thin film material for thin film formation with high vacuum sputtering film deposition equipment.

Product name Description: Al2O3 4N φ101.6xt5

■ Specifications Specifications:
・Material: Al2O3
・Purity: 99.99%
・Size Size: φ101.6xt5
・Other: Does not include bonding

Delivery: about 2 months (negotiable)

This is a pre order item. We will ship it when it comes in stock.