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Cleaning wafer to remove dirt/dust/particles on vacuum/vacuum/electrostatic/mechanical/pin chuck. Effective in reducing dummy wafer/wafer/wafer/wafer/wafer/wafer loss, reducing equipment downtime, and improving helium (He) leak/exposure failure. Lineup for 4, 5, 6, 8 and 12 inches.
RNC-25A-0020F(CCW-7020-001-257-FL), RNC-15B-0020F(CCW-7020-01-150-FL), RNC-15B-0020FA0(CCW-7020-01-150-NEX) , RNC-15B-0020FG7(CCW-7020-01-150-HT)
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