Non-vacuum mechanical chuck (adapter) for holding substrates for multi-purpose/multi-spin processors (spin coater/spinner/spinner) Polos. For wafer/wafer/wafer.
For more information is here
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Multi-purpose/multi-spin processor (spin coater/spinner/spinner) Vacuum chuck (adapter) for holding substrates for Polos. For wafer/wafer/wafer.
For more information is here
Standard Ch...
POLOS microwriter that enables optical exposure (photolithography). With confocal microscope. Equipped with microlaser control software. Mainly for 405nm laser. For research and development (R&...
POLOS micro printer that enables maskless exposure (photolithography). Equipped with software capable of micro-structuring, duplication and stitching. For research and development (R&D).
POL...
Dedicated probe for UV illuminance meter (Power Meter) Model 308 (365nm, 400nm, 420nm, 436nm, etc.). The successor model of the old model 306 manufactured by OAI. Calibration service is also availa...
Handy type UV illumination meter (Power Meter). The successor model of the old model 306 manufactured by OAI. Calibration service is also available. We also sell dedicated probes (365nm, 400nm, 420...
Desktop type nano-pattern exposure (photolithography) equipment. Using the Talbot effect, it is possible to perform batch exposure with a half-pitch of 150 nm for periodic structures. Ideal for de...
Handy type UV illuminance meter (power meter) with touch screen and built-in USB. The successor model of the old model 358 manufactured by OAI. Calibration service is also available. We also sell d...
UV light source (Light source). Collimated light source for photolithography/exposure/photolithography applications. Made by OAI. For semiconductors, MEMS, research and development (R&D), low ...
UV LED light source (Light source). Collimated light source for photolithography/exposure/photolithography applications. Made by OAI. For semiconductors, MEMS, research and development (R&D), ...
Single-sided mask aligner (adhesion/proximity/contact exposure) system. optical. Fully automatic/fully automatic. For liquid crystal/FPD/LCD/flat panel displays and medium mass production. Large s...
Single-sided mask aligner (adhesion/proximity/contact exposure) equipment. Optical back exposure type. Fully automatic/fully automatic. For semiconductors, MEMS, research and development (R&D)....
Double-sided mask aligner (adhesion/proximity/contact exposure) system. optical. Alignment of top or bottom surface is possible. Semi-automatic/semi-automatic. For research and development (R&...
Single-sided mask aligner (adhesion/proximity/contact exposure) system. Benchtop type, compact and easy to install. Manual type. For research and development (R&D). reasonable. For medium-sized...
Single-sided mask aligner (adhesion/proximity/contact exposure) equipment. It is compact and easy to install because it is a desk/tabletop type. Manual type. For research and development (R&D)...
Nanoimprint equipment for UV exposure (lithography). This equipment is suitable for pattern transfer to substrates with unevenness and undulations such as resin and film. Semi-automatic (semi-autom...
Nanoimprint equipment for UV exposure (lithography). This equipment is suitable for pattern transfer to substrates with unevenness and undulations such as resin and film. Manual type. A method in ...
