Nano-pattern exposure system PhableR 100

Desktop type nano-pattern exposure (photolithography) equipment. Using the Talbot effect, it is possible to perform batch exposure with a half-pitch of 150 nm for periodic structures. Ideal for device development with periodicity at electron beam drawing level resolution. Batch exposure with a half pitch of 75 nm is also possible when a DUV light source is selected.

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Specifications of the nano-pattern exposure system PhableR 100