UV Nanoimprint system TEX-02

Nanoimprint equipment for UV exposure (lithography). This equipment is suitable for pattern transfer to substrates with unevenness and undulations such as resin and film. Semi-automatic (semi-automatic). A method in which a substrate coated with resin (polymer) and a soft mold are brought into close contact.

• Simple configuration that does not require vacuum or pressurization
• Resolution: Fine structure pattern fabrication at 100nm level
• High productivity (1-2 minutes throughput)
• Higher residual film controllability (15 nm or less) than conventional nanoimprint equipment
• Achieves high in-plane uniformity due to excellent conformability to the substrate

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