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Load image into Gallery viewer, UV Nanoimprint system TEX-02
Load image into Gallery viewer, UV Nanoimprint system TEX-02
Load image into Gallery viewer, UV Nanoimprint system TEX-02
Load image into Gallery viewer, UV Nanoimprint system TEX-02
Load image into Gallery viewer, UV Nanoimprint system TEX-02
Load image into Gallery viewer, UV Nanoimprint system TEX-02
Load and play video in Gallery viewer, UV Nanoimprint system TEX-02

UV Nanoimprint system TEX-02

Vendor 協同インターナショナル
Regular price ¥40,000,000
Sale price ¥40,000,000 Regular price
Sale Sold out
Unit price
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Nanoimprint equipment for UV exposure (lithography). This equipment is suitable for pattern transfer to substrates with unevenness and undulations such as resin and film. Semi-automatic (semi-automatic). A method in which a substrate coated with resin (polymer) and a soft mold are brought into close contact.

  • Simple configuration that does not require vacuum or pressurization
  • Resolution: Fine structure pattern fabrication at 100nm level
  • High productivity (1-2 minutes throughput)
  • Higher residual film controllability (15 nm or less) than conventional nanoimprint equipment
  • Achieves high in-plane uniformity due to excellent conformability to the substrate

For more information is here

This is a pre order item. We will ship it when it comes in stock.