Chuck Cleaning Wafer for Glass Mask 6025

Cleaning wafer to remove dirt/dust/particles on vacuum/vacuum/electrostatic/mechanical/pin chuck. Effective in reducing dummy wafer/wafer/wafer/wafer/wafer/wafer loss, reducing equipment downtime, and improving helium (He) leak/exposure failure. Lineup for 4, 5, 6, 8 and 12 inches.

RNC-MCP-8601-CS(MCP-8601-CS), RNCM-0601S2G8(MCP-8601-2EE-CS), RNCM-0601S5G9(MCP-8601-EPO-5MM-CS), RNCM-0610S5G9(MCP-8610 -EPO-5MM-CS), RNCM-0601S5A1(MCP-8601-5EE)

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