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Cleaning wafer to remove dirt/dust/particles on vacuum/vacuum/electrostatic/mechanical/pin chuck. Effective in reducing dummy wafer/wafer/wafer/wafer/wafer/wafer loss, reducing equipment downtime, and improving helium (He) leak/exposure failure. Lineup for 4, 5, 6, 8 and 12 inches.
RNC-SCB-0043NG7(CCW-7043-01-SC4-HT), RNC-SCB-0043NH0(CCW-7043-01-SC4-HT-NEX), RNC-PHA-0043N(CCW-7043-001-PM- H), RNC-PPA-0043N(CCW-7043-001-PM-PLUS)
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