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Cleaning wafer to remove dirt/dust/particles on vacuum/vacuum/electrostatic/mechanical/pin chuck. Effective in reducing dummy wafer/wafer/wafer/wafer/wafer/wafer loss, reducing equipment downtime, and improving helium (He) leak/exposure failure. Lineup for 4, 5, 6, 8 and 12 inches.
RNC-15B-0021F(CCW-7021-01-150-FL), RNC-15B-0021FG4(CCW-7021-01-150CS), RNC-15B-0021FG4(CCW-7021-01-150-FL-CS)
For more information is here
*For 5-inch CCW, it is assumed that you will supply Si wafers, including spares.
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