Alumina target Al2O3 target φ152.4xt5

Ceramic sintered high-purity alumina target (Al2O3 sputtering target) thin film material for thin film formation with high-vacuum sputtering target deposition equipment.

Product name Description: Al2O3 4N φ152.4xt5

SpecificationsSpecification:
・Material: Al2O3
・Purity: 99.99%
・Size Size: φ152.4xt5
・Other: Does not include bonding

Delivery: about 2 months (negotiable)