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CVD装置用センタリングリングクランプの販売。AMAT(Applied Materials)/Novellus(ノべラス) Concept-One/1(コンセプトワン)又はTwo/2用。P/N:15-00653-00の互換品。材質:材質:アルミ(A6061)。 ※写真は代表的なものを載せているため、実物と異なる場合があります。
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ウェハ(25枚など)を別カセット(キャリア/キャリヤ)へ移動させるためのセーフガード用カバー・搬送機能付きのオートマチック(自動)式ウェハトランスファー(ウェハ移動ツール)。76mm(3インチ)、100mm(4インチ)、150mm(6インチ)、200mm(8インチ)用ウェハに対応した商品ラインアップ。     l  76 mm ~ 300 mm のウェハ用の精密ロボット制御 l  薄い、反り...
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Sales of Titan head clamps for CMP equipment. For AMAT Mirra. For 8 inch/200mm.
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Regular price ¥69,000
Sale price ¥69,000
Regular price ¥55,000
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Product name Description: W 4N φ10 x t5 ■ SpecificationsSpecification: ・Material: W ・Purity: 99.99% ・Size: φ10xt5 ■ Delivery: about 2 months (negotiable)
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Regular price ¥58,000
Sale price ¥58,000
Regular price ¥46,000
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Product name Description: W 3N φ10 x t5 ■ SpecificationsSpecification: ・Material: W ・Purity: 99.9% ・Size: φ10xt5 ■ Delivery: about 2 months (negotiable)
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Regular price ¥120,000
Sale price ¥120,000
Regular price ¥95,400
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Product name Description: Ta 3N5 φ20 x t 5 ■ SpecificationsSpecification: ・Material: Ta ・Purity: 99.95% ・Size: φ20xt5 ■ Delivery: about 2 months (negotiable)
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Regular price ¥68,000
Sale price ¥68,000
Regular price ¥54,000
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Product name Description: Ta 3N5 φ20 x t 5 ■ SpecificationsSpecification: ・Material: Ta ・Purity: 99.95% ・Size: φ20xt5 ■ Delivery: about 2 months (negotiable)
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Sales of turbo TTV assemblies (assies including motors) for CVD equipment. For AMAT (Applied Materials) Centura. Compatible with P/N: 0010-02570. *Photos are representative and may differ from the ...
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CMP装置用ターンテーブルモーターの修理/オーバーホール。主にベアリングの交換。P/N:C-5172-041-0001/C-5172-042-0001/K89EB7341B。EBARA(荏原) EPO用。形状や型番は写真と異なる場合あり(都度要問い合わせ)。
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Regular price ¥25,000
Sale price ¥25,000
Regular price ¥20,000
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Product name Description: Ti 3N φ10×t10 ■ SpecificationsSpecification: ・Material: Ti ・Purity: 99.9% ・Size: φ10xt10 ■ Delivery: about 2 months (negotiable)
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Regular price ¥23,000
Sale price ¥23,000
Regular price ¥18,000
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Product name Description: Ti 3N φ10×t5 ■ SpecificationsSpecification: ・Material: Ti ・Purity: 99.9% ・Size: φ10xt5 ■ Delivery: about 2 months (negotiable)
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Regular price ¥21,000
Sale price ¥21,000
Regular price ¥16,700
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Product name Description: Ti 3N φ15×t5 ■ SpecificationsSpecification: ・Material: Ti ・Purity: 99.9% ・Size: φ15xt5 ■ Delivery: about 2 months (negotiable)
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Product name Description: Ti 3N φ101.6×t5 ■ SpecificationsSpecification: ・Material: Ti ・Purity: 99.9% ・Size: φ101.6xt5 ・Other: Does not include bonding ■ Delivery: about 2 months (negotiable...
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Product name Description: Ti 3N8 φ101.6×t5 ■ SpecificationsSpecification: ・Material: Ti ・Purity: 99.98% ・Size: φ1101.6xt5 ・Other: Does not include bonding ■ Delivery: about 2 months (negotia...
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Product name Description: Ti 4Nup φ101.6×t5 ■ SpecificationsSpecification: ・Material: Ti ・Purity: 99.99% up ・Size: φ101.6xt5 ・Other: Does not include bonding ■ Delivery: about 2 months (nego...
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Product name Description: Ti 3N φ152.4×t5 ■ SpecificationsSpecification: ・Material: Ti ・Purity: 99.9% ・Size: φ152.4xt5 ・Other: Does not include bonding ■ Delivery: about 2 months (negotiabl...
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Product name Description: Ti 3N8 φ101.6×t5 ■ SpecificationsSpecification: ・Material: Ti ・Purity: 99.98% ・Size: φ1101.6xt5 ・Other: Does not include bonding ■ Delivery: about 2 months (negotia...
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Product name Description: Ti 4Nup φ152.4×t5 ■ SpecificationsSpecification: ・Material: Ti ・Purity: 99.99% up ・Size: φ152.4xt5 ・Other: Does not include bonding ■ Delivery: about 2 months (negot...
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Regular price ¥14,000
Sale price ¥14,000
Regular price ¥11,000
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Product name Description: Ti 2Nup φ2 x L40 ■ SpecificationsSpecification: ・Material: Ti ・Purity: 99% up ・Size: φ2xL40 ■ Delivery: about 2 months (negotiable)
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Cleaning wafer to remove dirt/dust/particles on vacuum/vacuum/electrostatic/mechanical/pin chuck. Effective in reducing dummy wafer/wafer/wafer/wafer/wafer/wafer loss, reducing equipment downtime, ...
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Cleaning wafer to remove dirt/dust/particles on vacuum/vacuum/electrostatic/mechanical/pin chuck. Effective in reducing dummy wafer/wafer/wafer/wafer/wafer/wafer loss, reducing equipment downtime,...
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Cleaning wafer to remove dirt/dust/particles on vacuum/vacuum/electrostatic/mechanical/pin chuck. Effective in reducing dummy wafer/wafer/wafer/wafer/wafer/wafer loss, reducing equipment downtime, ...
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Cleaning wafer to remove dirt/dust/particles on vacuum/vacuum/electrostatic/mechanical/pin chuck. Effective in reducing dummy wafer/wafer/wafer/wafer/wafer/wafer loss, reducing equipment downtime, ...
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Cleaning wafer to remove dirt/dust/particles on vacuum/vacuum/electrostatic/mechanical/pin chuck. Effective in reducing dummy wafer/wafer/wafer/wafer/wafer/wafer loss, reducing equipment downtime,...